Huawei has patented one component used in EUV lithography systems that is required to make high-end processors on sub-10 nm nodes. It solves the problem of interference patterns created by the ultraviolet light that would otherwise make the wafer uneven.
https://www.techspot.com/news/97072-huawei-patents-euv-lithography-tools-used-make-10nm.html?utm_source=dlvr.it&utm_medium=blogger
https://www.techspot.com/news/97072-huawei-patents-euv-lithography-tools-used-make-10nm.html?utm_source=dlvr.it&utm_medium=blogger